Auger Electron Spectroscopy-A Review

Authors

  • K. Bhavyasri Associate Professor, Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India
  • M. Sreshta Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India
  • R. Swethasri Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

DOI:

https://doi.org/10.22270/ajprd.v7i3.508

Keywords:

Auger Electron, Mettalurgy, Corrosion.

Abstract

Auger electron spectroscopy (AES) is surface sensitive analytical technique mainly,it provides quantitative elemental and chemical state information from surfaces of solid materials.It utilizes a high current, finely focused electron beam as an excitation source.In AES,A sample is probed with electron beam with energy between 3 to 3o Kev which results in ejection of electron in core level, filled by an outer level electron with excess energy being used then, this excess energy used to emit an electron this, emitted electron is said as Auger electron. That result as function of auger electron energy. The resulting spectra is obtained used to determine the composition of samples. The Auger electron kinetic energies are characteristic of emitting atoms and the measurement of their energies is used to identify the elements variation of composition with depth can be determined by ion sputtering technique. Lastly,AES is applicable for detection of thin films, characterization of materials, metallurgy and corrosion science.

 

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Author Biographies

K. Bhavyasri, Associate Professor, Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

Associate Professor, Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

M. Sreshta, Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

R. Swethasri, Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

Department of Pharmaceutical Analysis, RBVRR Women’s College of Pharmacy, Hyderabad, India

References

1. Briggs D. Auger and X-ray photoelectron spectroscopy. Practical Surface Analysis. 1983; 1(9):533.
2. Chao LC, Yang SH. Growth and Auger electron spectroscopy characterization of donut-shaped ZnO
nanostructures. Applied surface science. 2007; 253(17):7162-65.
3. Kryzhevoi NV, Cederbaum LS. Exploring protonation and deprotonation effects with Auger electron spectroscopy.
The journal of physical chemistry letters. 2012; 3(18):2733-37.
4. Gondran CF, Johnson C (et.al) Auger electron spectroscopy depth profile analysis to verify an interfacial reaction
at the Hf N∕ Si O 2 interface. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer
Structures Processing, Measurement, and Phenomena. 2006; 24(5):2457-59.
5. Chung MF, Jenkins LH. Auger electron energies of the outer shell electrons. Surface Science.1970; 22(2):479-485
6. O’Connor DJ, Sexton BA (et.al) Surface analysis methods in materials science. Springer Science & Business
Media; 2013; 24:3-69.
7. Narumand DH, Childs KD. Auger Spectrometers: A Tutorial Review. Applied Spectroscopy Reviews. 2004;
34(3):139-58
8. Briggs D, Grant JT, Surface analysis by Auger and X-ray photoelectron spectroscopy. Surface Spectra; 2012; 31
9. Gunawardane RP, Arumainayagam CR. Auger electron spectroscopy. In Handbook of applied solid state
spectroscopy 2006; 451-483.
10. Watts JF, Wolstenholme J. An introduction to surface analysis by XPS and AES, Surface and Interface
Analysis.1989; 14(8):48
11. Seah MP, Gilmore IS(et.al) Quantitative AES IX and quantitative XPS II: Auger and x‐ray photoelectron intensities
and sensitivity factors from spectral digital databases reanalyzed using a REELS database. Surface and Interface
Analysis: An International Journal devoted to the development and application of techniques for the analysis of
surfaces, interfaces and thin films. 2001; 31(8):778-95.
12. Sekine T, Ikeo N,(et.al) Analysis of polymers by auger electron spectroscopy with a cold stage. Surface and
interface analysis. 1995; 23(6):386-90.
13. Auger P. Sur l'effetphotoélectriquecomposé. Journal de Physique et le Radium.1925; 6(6):205-8.
14. Hofmann S. Advances in sputter depth profiling using AES. Surface and Interface Analysis: An International
Journal devoted to the development and application of techniques for the analysis of surfaces, interfaces and thin
films. 2003; 35(7):556-63.
15. http://www.nanoscience.co.jp/industry_analysis/pdf/BN1500.pdf
16. https://www.sciencedirect.com/science/article/pii/002230937590068X
17. http://citeseerx.ist.psu.edu/viewdoc/download?doi=10.1.1.610.1278&rep=rep1&type=pdf
18. L. E. Davis, N. C. MacDonald(et.al), Handbook of Auger Electron Spectroscopy, Physical Electronics Industries,
Inc., 1976

Published

2019-06-15

How to Cite

Bhavyasri, K., Sreshta, M., & Swethasri, R. (2019). Auger Electron Spectroscopy-A Review. Asian Journal of Pharmaceutical Research and Development, 7(3), 100–103. https://doi.org/10.22270/ajprd.v7i3.508